DEPOSITION
Building films atom by atom
Deposition tools lay down thin films. Sputtering and evaporation release material from a source onto the substrate. Chemical vapor deposition (CVD) grows films from reacting gases. Atomic layer deposition (ALD) adds one atomic layer per cycle. They make current collectors, oxide layers, and conformal coatings.
WHAT EACH BRINGS
Choosing a deposition method
LIFT-OFF
Patterning without etching
For metals that are hard to etch, pattern the resist first, deposit metal over everything, then dissolve the resist. The metal sitting on the resist lifts away, and only the metal that touched the substrate remains. It's a common way to make thin-film current collectors, such as interleaved gold fingers.
ETCHING
Carving out surface area
Wet etching
A chemical bath removes material. Cheap and simple, but it usually cuts sideways too
Plasma etching (RIE)
Ions and reactive gas remove material with much more directional control
Deep RIE (DRIE)
Cuts tall, near-vertical trenches and pillars deep into silicon
TEMPLATES
Let a template set the geometry
Anodizing aluminum in acid grows a regular honeycomb of nanoscale pores, called anodic aluminum oxide. Filling those pores with carbon or a conductor, or anodizing titanium into an array of nanotubes, gives ordered, high-area electrodes without lithography.
UNIT 33 STUDY COMPLETE
Ready for the Fab Challenge?
You've covered thin films, lift-off, deep etching, and anodized templates.