THE NODES
Built at the leading edge
Top AI chips are made on the most advanced processes available: NVIDIA's H100 and B200 on TSMC 4 nm-class processes, with newer chips moving to 3 nm and below. Smaller, denser transistors mean more MACs per mm² and less energy per operation.
THE FLOW
From bare wafer to AI die
An AI chip goes through the same steps you met in Sand to Chip, repeated for dozens of layers: deposit, pattern, etch, implant and polish, then build more than a dozen layers of copper wiring on top.
EUV
Printing with 13.5 nm light
Extreme ultraviolet (EUV) lithography uses 13.5 nm light, made by hitting tiny tin droplets with a powerful laser tens of thousands of times a second. Because EUV is absorbed by almost everything, including air and glass, the scanner uses mirrors in a vacuum. ASML in the Netherlands is the only maker of EUV scanners.
THE TRANSISTOR
From FinFET to nanosheet
WHY IT MATTERS FOR AI
Every node is more AI per watt
AI chips burn most of their power switching transistors and driving wires. A newer node lowers the energy of each switch and shortens wires, so more math fits within the same power limit. But each new node costs more per wafer, which pushes designers to use it only where it counts.
UNIT 9 STUDY COMPLETE
Ready for the Fab Challenge?
You've followed an AI die through a leading-edge fab and seen why EUV lithography and new transistor shapes matter for AI.